TFS 500 --Atomic Layer Deposition (ALD) ALD belongs to the group of chemical vapor deposition methods. It was initially developed for manufa..
TFS NX300 1.modulize design for different tube set-up 2.batch deposition system 3.fully automated system 4...
TFS 200 1. highly flexible research platform and modulize design. 2 capacitively-coupled plasma(CCP) is ava..
P800 1. Thick batch processes necessitate optimized handling of precursor source materials and advanced p..
WCS500 1. It offers true roll–to–roll ALD on flexible webs up to 500 mm in width. 2. Process t..