SI 500 PPD


  • BRAND: Sentech
  • DESCRIPTION: Inductively coupled plasma etching system
  • Nation of Principal:Germany
    Product Application
    SiO2, SINx, SiOxNy, and a-Si 
                                       in a temperature range of RT 
                                       to 350 °C

    Related Linkhttp://www.sentech.de/
    Keyword:
    PECVD



1.PECVD with highly process flexibility on temperature & film
2.Vacuum loadlock with cleanliness of deposition processes
3.Available for the deposition of TEOS, SiC, and other materials with liquid or gaseous precursors
4.up to 200mm wafer

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