Semiconductorn&k

3700-RT

  • BRAND： n&k
  • DESCRIPTION： Measuring the thicknesses, n index and k index, CD, depth and profiles of the thin film growth on the photomask

  • Nation of Principal：U.S.A
    Product Application    ：The automated system is designed for handling 5” or 6” square masks or up to 8” square samples and transparent wafers. It can measure  thichness, n index, k index and depth
    Related Link： http://www.nandk.com/
    Keyword：film thickness, OCD, n ,k measurement


1. The spectral range of this system is 190-1000nm
2. The reflectence measurement Spot Size is 50um and the transmittance measurement Spot Size is 400um
3. The automated system is designed for handling 5” or 6” square masks or up to 8” square samples.
4. The system can also be configured for transparent wafers.
5.  The system provide non-destructive, real time measurement
6. The system provide high throughput measurements directly on the device