• BRAND: n&k
  • DESCRIPTION: Automated measuring the thicknesses, n index and k index, CD, depth and profiles of the thin film growth on the photomask
  • Nation of Principal:U.S.A
    Product Application
    The automated system is configured for Photomask and Imprint Lithography applications and can measure  thichness, n index, k index, depth, CD and profile.
    Related Link
    Keyword:film thickness, OCD, n ,k measurement

1. The spectral range of this system is 190-1000nm
2. The reflectence and transmittance measurement Spot Size are 50um
3. The system provide non-destructive, real time measurement
4. The system provide high throughput measurements directly on the device