SI 500 D


  • BRAND: Sentech
  • DESCRIPTION: ICP plasma deposition system
  • Nation of Principal:Germany
    Product Application

    1. Exceptional high density plasma
    2. Planar ICP plasma source
    3. Outstanding properties of deposited layers
    4. Dynamic temperature control

    Related Linkhttp://www.sentech.de/
    Keyword:PECVD




It provides excellent performance for silane based deposition processes in Si and III-V semiconductor technology.

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