The latest website of the n&k ‘s production introduction.
n&k Technology, Inc, a professional thin film metrology tool provider for the semiconductor, photomask, data storage, flat panel display and solar cell industries. n&k’s large family of tools provide measurements for a large range of OCD(Optical Critical Dimension) and thin film structures that cover current and future applications.n&k’s thin film measurement systems accurately and repeatably determine thicknesses, n and k spectra and energy band gap of ultra-thin (e.g., a mono-layer of graphene) and ultra-thick films(e.g. Epi-Si layers) comprising single-layer and multi-layer film stacks. Films can be deposited on either rough or smooth surfaces, and transparent substrate also. n&k’s scatterometers accurately and repeatably determine depth, CD, and profiles of complex 2D (trenches) and 3D (contact holes) structures n&k Technology’s scatterometers and thin film metrology tools are field-proven, production-
worthy, fast, and non-destructive, enabling process control and yield improvement tool. Please refer to the latest website for more information. The website is http://www.nandk.com/。
worthy, fast, and non-destructive, enabling process control and yield improvement tool. Please refer to the latest website for more information. The website is http://www.nandk.com/。