• TFS 500 --Atomic Layer Deposition (ALD)
  • 產品廠牌: Beneq
    產品簡述: ALD system for Pinhole–free films with surface passivation growth
    Nation of Principal:Finland
    Product Application:
    ALD, as a thin film coating
                                       method, offers:
    • Precise control of the film thickness, at true nanometer 
    • Pinhole–free films for, e.g., superior barriers and surface
    • Conformal coating of batches, large–area substrates and
      complex 3D objects, including porous bulk materials,
      as well as powders.
    • Engineered and new functional materials and structures,
      such as nano laminates.
    • A highly repeatable and scalable process.
    Related Link:
    Keyword:Atomic layer deposition, ALD

 ALD belongs to the group of chemical vapor deposition methods. It was initially developed for manufacturing nanolaminate insulators (Al2O3/TiO2) and zinc sulfide (ZnS) phosphor films for thin film electroluminescent (TFEL) displays.