SIPAR


  • BRAND: Sentech
  • DESCRIPTION:
  • Nation of PrincipalGermany
    Product Application
    Combines PECVD and ALD in one Reactor.
    Related Link
    http://www.sentech.de/

1. Lower price, higher throughput and smaller footprint
2. Hybrid multilayers composed of uniformly and conformal deposited ALD layers and PECVD films at the same reaction chamber.
3. Fast switching and fast purging between ALD layers and PECVD films.

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